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Influence of nanostructure and nitrogen content on the optical and electrical properties of reactively sputtered FeAlSi(N) films

Lee, S. J., Snyder, John Evan, Lo, C. C. H., Campos-Anderson, K. M., Andregg, J. W. and Jiles, David 2003. Influence of nanostructure and nitrogen content on the optical and electrical properties of reactively sputtered FeAlSi(N) films. Journal of Applied Physics 94 (4) , pp. 2607-2611. 10.1063/1.1593802

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Item Type: Article
Schools: Engineering
ISSN: 0021-8979
Last Modified: 04 Jun 2017 02:02
URI: http://orca-mwe.cf.ac.uk/id/eprint/7914

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